Thin Films - Stresses and Mechanical Properties X: Volume 795 (MRS Proceedings) » holypet.ru

We studied on the thermal annealing effect on the residual stress and the mechanical properties in thin compressive stressed diamond-like carbon film on Si substrate. Annealing experiments were carried out with Rapid Thermal Procedure system at 200–600 °C, and the stress change with annealing temperature was investigated by in-situ stress. MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS VOLUM E 795 Thin Films—Stresses and Mechanical Properties X Symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A. EDITORS: Sean G. Corcoran Virginia Tech Blacksburg, Virginia, U.S.A. Young-Chang Joo Seoul National University Seoul, Korea Neville R. Moody Sandia National Laboratories. Residual Stress in Silicon Nitride Thin Films Deposited by ECR-PECVD - Volume 795 - E. Cianci, V. Foglietti Skip to main content Accessibility help We use cookies to distinguish you from other users and to provide you with a better experience on our websites.

The mechanical properties of two viscoelastic thin films were measured, a polyimide and a low-k polymer dielectric. The static modulus and hardness were obtained from nanoindentation experiments using an elastic-plastic unloading model J. Mater. Res., 13, 421 1998. 978-1-107-41085-5 - Thin Films: Stresses and Mechanical Properties: Materials Research Society Symposium Proceedings: Volume 130 Editors: John C. Bravman, William D. Nix, David M. Barnett and David A. Smith Frontmatter More information. Oct 01, 1996 · Thin Films: Stresses and Mechanical Properties V, 356, Materials Research Society Symposia Proceedings, Pittsburgh, PA 1995 6 WW Gerberich, H Gao, J-E Sungdren, SP Baker Eds., Thin Films: Stresses and Mechanical Properties VI, 436, Materials Research Society Symposia Proceedings, Pittsburgh, PA 1996. Volume 795 Symposium U – Thin Films - Stresses and Mechanical Properties X 2003, U3.3 Measurement of Residual Stress in ZnO Thin Films Deposited on Silicon Wafers by.

This study reported a novel method for tuning thin film mechanical properties by means of plasma surface modification. In order to demonstrate the feasibility of this approach, various plasma treatments, including O 2, H 2, NH 3 atmospheres, were implemented to tune the Young's modulus and residual stress of SiO 2 film. Nov 12, 1987 · Thin Solid Films, 154 1987 109-124 109 THE MECHANICAL PROPERTIES OF THIN FILMS: A REVIEW D. A. HARDWICK Materials Science and Technology Division, M8 K765, Los Alamos National Laboratory, Los Alamos, NM 87545 U.S.A. Received March 25, 1987 Methods for the determination of thin film mechanical properties will be reviewed with an emphasis on their. 978-1-107-41011-4 - Materials Research Society Symposium Proceedings: Volume 188: Thin Films: Stresses and Mechanical Properties II Editors: M. F. Doerner, W. C. Oliver, G. M. Pharr and F. R. Brotzen Frontmatter More information.

Thin Films - Stresses and Mechanical Properties X: Volume 795 (MRS Proceedings)

978-1-107-41206-4 - Materials Research Society Symposium Proceedings: Volume 695: Thin Films: Stresses and Mechanical Properties IX Editors: Cengiz S. Ozkan, L. Ben Freund, Robert C. Cammarata and Huajian Gao Frontmatter More informatio n.

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