Nov 30, 2008 · 4. Summary. We developed a method to form semiconductor nanodots on Si substrates by using ultrathin Si oxide technology and the results on their optical properties. We could form ultra-small semiconductor nanodots with the size of ∼5 nm and ultra-high density of ∼10 12 cm −2 on Si surfaces covered with ultrathin SiO 2 films of ∼0.3 nm. Conference: Materials Research Society Symposium Proceedings 1305, AA12-03 2011 / Materials Research Society 2010 Fall Meeting, Volume: Materials Research Society Symposium Proceedings. Volume 958 Symposium L – Group IV Semiconductor Nanostructures—2006 2006, 0958-L06-08 Formation of a Thermally Stable NiSi FUSI Gate Electrode by a Novel Integration Process Shiang Yu Tan a1, Hsien-Chia Chiu a2 and Chun-Yen Hu a2. Apr 02, 2010 · L. Tsybeskov, D.J. Lockwood, C. Delerue, M. Ichikawa, A.W. van Buuren Eds., Group IV Semiconductor Nanostructures, Boston, U.S.A., November 27 – December 1, 2006, Materials Research Society Symposium Proceedings, vol. 958 2007, p. 227.
The full text of this article hosted atis unavailable due to technical difficulties. Conference: Materials Research Society Symposium Proceedings 1404, W07-03 2012 / Materials Research Society 2011 Fall Meeting, Volume: Materials Research Society Symposium Proceedings.
Epitaxial Growth of III-V Nanowires on Group IV Substrates Erik Bakkers et al 2008 MRS Proceedings 1068 1068-C02-04. Crossref. Monolithic GaAs/InGaP nanowire light emitting diodes on silicon C Patrik T Svensson et al 2008 Nanotechnology 19 305201. IOPscience. Properties of the ubiquitous p–n junction in semiconductor nanowires M Zervos 2008. We present a quantitative analysis of Raman scattering in various Si/Si 1-x Ge x multilayered nanostructures with well-defined Ge composition x and layer thicknesses.Using Raman and transmission electron microscopy data, we discuss and model Si/SiGe intermixing and strain. We report the two-dimensional alignment of semiconductor islands using rudimentary metal patterning to control nucleation and growth. In the Ge on Si system, a square array of submicron Au dots on the Si 001 surface induces the assembly of deposited Ge adatoms into an extensive island lattice. Remarkably, these highly ordered Ge islands form between the patterned Au dots and are. A detailed study of the carrier absorption CA mechanism in multilayered silicon-nanocrystals Si-nc rib waveguides is reported. A pump 532 nm and probe 1535 nm technique is used to assess two loss mechanisms due to optical excitation of the system: one characterized by slow seconds dynamics related to heating and the other characterized by fast microsecond dynamics associated to CA. Science and technology of semiconductor-on-insulator structures and devices operating in a harsh environment 2006 Semiconductor physical electronics 2006 Dynamical Properties of IV-VI Compounds 2006.
Semiconductor nanostructures: recent theoretical results. Group-IV Semiconductor Nanostructures - Materials Research Society 2006 Fall Symposium Proceedings, volume 958.. Jan 01, 2007 · 8.1. OVERVIEW. This chapter focuses on mathematical and physical aspects of modeling semiconductor nanostructures. There are several excellent full-length monographs on the physics and technology of semiconductor nanostructures [1., 2., 3.], and an equally broad and comprehensive review of the topic is not the aim of the present work.The purpose of this chapter is to present an. We show that high quality tensile-strained n-doped germanium films can be obtained on InGaAs buffer layers using metal-organic chemical vapor deposition with isobutyl germane as germanium precursor. A tensile strain up to 0.5% is achieved, simultaneously measured by x-ray diffraction and Raman spectroscopy. The effect of tensile strain on band gap energy is directly observed by room. The devices show Coulomb blockade corresponding to a charging energy of 19.4 meV and can be switched from the nonconducting to a conducting state giving rise to Coulomb diamonds. The behavior is well reproduced by a numerical orthodox theory calculation. This symposium is the sixth installment of a highly successful biennial series that began in 2007. It presents the latest research in semiconductor nanostructures and their applications to electronic, optoelectronic and photonic devices. It covers all aspects from fundamental nanostructure fabrication and material development, to device integration and performance evaluation.
Soref, R, Kouvetakis, J & Menendez, J 2007, Advances in SiGeSn/Ge technology. in Group IV Semiconductor Nanostructures-2006. Materials Research Society Symposium Proceedings, vol. 958, pp. 13-24, 2006 MRS Fall Meeting, Boston, MA, United States, 11/27/06. 4. Jian-Ping Wang editor, “Magnetic Nanostructures”, MRS Proceedings of Symposium I, Nov. 2007 JOURNAL PAPERS Research topic: Magnetic Nanoparticles and Nanostructures 1. “FePt Magnetic Nanoparticles and their Assemblies for Future Magnetic Media”, PROCEEDINGS of IEEE, Invited Paper in Special Issue on Advances of Magnetic Storage.
|Conference proceedings TO BE UPDATED. The Role of Local Fields in the Optical Properties of Silicon Nanocrystals F. Trani, D. Ninno, G. Cantele and G. Iadonisi, in: Group IV Semiconductor Nanostructures, Mater. Res. Soc. Symp. Proc. 958; Electronic and Optical Properties of Silicon Nanocrystals: Structural Effects.||Volume 958 Symposium L – Group IV Semiconductor Nanostructures—2006 2006, 0958-L07-06 Structural and Optical Properties of Al2O3 with Si and Ge Nanocrystals Selcuk Yerci a1, Ilker Yildiz a2, Ayse Seyhan a3, Mustafa Kulakci a4, Ugur Serincan a5, Michael Shandalov a6, Yuval Golan a7 and Rasit Turan a8.|
SALVO MIRABELLA WoS Researcher ID: E-4672-2010 received his Laurea 1999 and PhD 2003 in Physics from University of Catania Italy. Since 2003 he was a staff researcher at INFM-MATIS first and at CNR-IMM Consiglio Nazionale delle Ricerche – Istituto per la Microelettronica e Microsistemi later, being also an elected member of the IMM-Consiglio di Istituto. Proceedings of Symposium T E-MRS 2006 Spring Meeting on Germanium based semiconductors from materials to devices Edited by C. Claeys, T. Peaker, B. Svensson, J. Vanhellemont Volume 9, Issues 4. May 29, 2018 · Semiconductor nanostructures are of great interest and importance to the research community due to their novel properties and interdisciplinary applications such as in nanoelectronics [1–8], nanophotonics [9–11], bio-sensing [12–16], optoelectronics [17–24], and solar cells [25–33].Semiconductor nanostructures are also being considered as potential building blocks of. Photoluminescence from charged colloidal CdSe quantum dots, with definite and controllable electron occupation, is observed. As charged nanocrystals still emit light but are transparent at the emission wavelength, the threshold for amplified stimulated emission is strongly reduced. We demonstrate 65% threshold reduction in charged CdSe nanocrystal films, and further reduction should be feasible. The electrical transport properties of field effect transistor FET devices made of silicon nanowires SiNWs synthesized by pulsed laser vaporization PLV were studied. From as-grown PLV-SiNW FET, we found p-channel FET behavior with low conductance. To improve conductance, spin on glass SOG and vapor doping were used to dope phosphorus and indium into SiNW, respectively.
S.P. McGinnis, J.N. Cleary, B. Das, “The Fabrication of Semiconductor Nanostructure Arrays on a Silicon Substrate Using an Anodized Aluminum Template”, Advances in Microcrystalline and Nanocrystalline Semiconductors - 1996, 1996 MRS Fall Meeting Proceedings, Vol. 452, 1997. Journal Publications Book Chapters Conference Proceedings Invited Presentations Google Scholar & Publons. Y. Y. Zhou, J. H. Kim, L. Shi, “Four Probe Thermal Transport Measurements of Mesoscale Structures,” Proceedings of the 16 th International Heat Transfer Conference, Beijing 2018. P. Jurney, R. Agarwal, V. Singh, K. Roy, S.V. Sreenavasen, L. Shi, “The Effect of Nanoparticle. Her research focusses on tailoring the light matter interactions in III–V semiconductor nanostructures for optoelectronic device applications. IEEE, APS, MRS, OSA, AVS, ECS, SPIE, AAAS, IoP UK, IET UK, IoN UK, EMA and the AIP. He has received Peter Baume Award from the ANU in 2006, the Quantum Device Award from ISCS in 2010, IEEE. Search result for masaharu-ishikawa: Catalysis by Electron Donor-acceptor Complexes9789811206023, Statistical Research on Fatigue and Fracture9780470844359, Heavy-ion Reactions With Neutron-rich Beams - Proceedings Of The Riken International Workshop9781558999152, Group-IV Semiconductor Nanostructures: Volume 8329789810215965, Group IV Semiconductor Nanostructures - 2006: Volume 958.
David J. Lockwood is the author of Silicon Photonics II 3.00 avg rating, 1 rating, 0 reviews, published 2010, Light Scattering in Semiconductor Structu. Vol. 958, Group IV Semiconductor Nanostructures, Warrendale, PA, USA, 2007, p. 0958-L07-05 2007 Other authors Hydrogenation-assisted nano-crystallization of amorphous silicon by radio-frequency.
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