Amorphous Silicon Technology: Volume 118 (MRS Proceedings) » holypet.ru

Feb 26, 2011 · Characteristics and Reliability of Amorphous Silicon Photocnductor Drums for PPC or LBP - Volume 118 - H. Itoh, H. Takemura, T. Sasaki, N. Miyamoto, H. Higuchi, K. Volume 118 Symposium E – Amorphous Silicon Technology 1988, 129 Equilibrium Between Charge Carriers, Charged Centers, and Dangling Bonds in Amorphous Silicon C. Fortmann a1. Vertically Integrated Amorphous Silicon Particle Sensors - Volume 808 - N. Wyrsch, C. Miazza, S. Dunand, A. Shah, D. Moraes, G. Anelli, M. Despeisse, P. Jarron, G. Volume 118 Symposium E – Amorphous Silicon Technology 1988, 653 Amorphous Silicon-Germanium Deposited by Photo-CVD: Effect of Hydrogen Dilution and Substrate Temperature. Flat‐panel imagers consisting of the first large area, self‐scanning, pixelated, solid‐state arrays made with hydrogenated amorphous silicon a‐Si:H are under development by the authors for applicat.

Comparison of an amorphous silicon/cesium iodide flat‐panel digital chest radiography system with screen/film and computed radiography systems — A contrast‐detail phantom study Xiujiang J. Rong Department of Diagnostic Radiology, University of Texas M.. 2007 Spring Meeting Symposium Proceedings, MRS Proceedings Volume 989 Symposium A: Amorphous and Polycrystalline Thin-Film Silicon Science and Technology ¿ 2007 Editors HA Atwater, V Chu, S Wagner, K Yamamoto, S Miyazaki, A Nathan, J Yang, HW Zan. Amorphous hydrogenated silicon a-Si:H films were deposited from disilane at substrate temperatures between 180 and 390 °C using a F 2-laser 157 nm in a parallel configuration. Material properties such as hydrogen content, SiH and SiH 2 group concentration, photo-and dark conductivity, band-gap energy and the Urbach parameter were. Amorphous Silicon Technology - 1994: Volume 336 MRS Proceedings Hardcover – November 4, 1994 by Michael Hack Editor, Arun Madan Editor, Akihisa Matsuda Editor, Martin Powell Editor, Eric A. Schiff Editor & 2 more. MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS VOLUME 862 Amorphous and Nanocrystalline Silicon Science and Technology — 2005 Symposium held March 28-April 1, 2005, San Francisco, California, U.S.A. EDITORS: Robert W. Collins University of Toledo Toledo, Ohio, U.S.A. P. Craig Taylor University of Utah Salt Lake City, Utah, U.S.A. Michio Kondo.

Amorphous Silicon Technology: Volume 118 (MRS Proceedings)

978-1-107-40954-5 - Materials Research Society Symposium Proceedings: Volume 297: Amorphous Silicon Technology 1993 Editors: Eric A. Schiff, Malcolm J. Thompson, Arun Madan, Kazunobu Tanaka and Peter G. LeComber Frontmatter More information.

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